| 摘要 |
PROBLEM TO BE SOLVED: To provide a laser annealing apparatus for controlling the contamination of a window. SOLUTION: A part of the wall of a chamber 1 in the hermetically sealed structure is formed of a window 2. A substrate W is allocated at a position opposing the window 2 in the chamber 1. An excimer laser emitting apparatus 4 located outside the chamber 1 inputs a processing laser beam L to the substrate W via the window 2. The chamber 1 is connected with a gas guiding pipe 8 and a gas absorbing pipe 9. The gas guiding pipe 8 blows gas to a region opposing the window 2 at the surface of the substrate W. The gas absorbing pipe 9 absorbs the gas blown to the substrate W by a gas guiding pipe 8. COPYRIGHT: (C)2006,JPO&NCIPI
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