| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering apparatus provided with anti-deposition plates for particularly preventing deposition of an insulator or the like to the wall surface of a vacuum vessel for ensuring formation of the film of a desired composition without inclusion of a foreign matter, and maintaining productivity by preventing change in the condition of plasma by aging. SOLUTION: The anti-deposition plates are formed of a metal material in duplication under the non-contact conditions. A DC negative potential is impressed to the external anti-deposition plate among the duplicated anti-deposition plates. COPYRIGHT: (C)2006,JPO&NCIPI
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