| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas supply tube for plasma treatment, wherein clogging is hardly caused by the sticking of vapor deposition components, and further, the peeling of the stuck vapor deposition components is effectively suppressed, and uniform gas supply can be performed stably over a long period. SOLUTION: In the gas supply tube which is inserted to the inside of a vessel held inside a plasma treatment chamber, for supplying gas for plasma treatment into the vessel, a gas flow passage is extended in the axial direction, also at least the surface part in the tube wall is formed of a porous body, and, gas blowout holes with a diameter of ≥0.2 mm are formed at suitable intervals in the axial direction or circumferential direction in the tube wall. COPYRIGHT: (C)2006,JPO&NCIPI
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