发明名称 Pattern inspection method and apparatus
摘要 A color image of an inspection object is taken by an imaging means capable of taking a color image to obtain color information of an RGB color space. A gray-scale image of a color component of the RGB color space or another color space is generated, and the inspection object is detected by a pattern recognition technique. Alternatively, a binary image is generated from the generated gray-scale image, and the inspection object is detected by performing pattern recognition on the binary image. Color data of a pixel occupied by the detected inspection object is compared with color data of a non-defective inspection object which is previously prepared to judge whether or not the inspection object is defective. In addition, this judgment result is reflected in another manufacturing step through a network and product quality is improved.
申请公布号 US2006210142(A1) 申请公布日期 2006.09.21
申请号 US20060334476 申请日期 2006.01.19
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 OGUNI TEPPEI;NISHIJIMA TATSUJI;MIYANAGA AKIHARU
分类号 H04N7/18;G06K9/00 主分类号 H04N7/18
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