发明名称 Löthöckererzeugung
摘要 <p>Connection bumps (54) for a semiconductor device are formed using a plating device which comprises: a plating tank (32); a holding jig (34) detachably attached to an object (35) to be plated, the holding jig (34) being connected with a cathode and electrically connected with the object (35) to be plated, the object (35) to be plated being dipped in a plating solution, by the holding jig (34), upright or obliquely to the surface of the plating solution in the plating tank with the surface to be plated directed upwards. A cylindrical body (39) made of insulating material is arranged in the front of the object (35) with a small clearance left between the cylindrical body (39) and the surface to be plated and with the axis of the cylindrical body (39) substantially perpendicular to the surface to be plated. An anode (37) is arranged in the cylindrical body (39) facing the surface of the object (35) to be plated; and a nozzle (40) is arranged in the cylindrical body (39) penetrating the anode plate (37). The plating solution is jetted onto the surface to be plated from the nozzle (40) located in the cylindrical body (39) to ensure uniform plating which ensures uniform bumps (54) and the orientation of the object (35) ensures that air can easily be discharged from holes in it during plating. <IMAGE></p>
申请公布号 DE69834521(T2) 申请公布日期 2006.09.21
申请号 DE1998634521T 申请日期 1998.03.30
申请人 SHINKO ELECTRIC INDUSTRIES CO. LTD. 发明人 IHARA, YOSHIHIRO;KANAZAWA, TAKEO;KOBAYASHI, TSUYOSHI
分类号 C25D7/12;H05K3/34;C25D5/08;H01L21/48;H01L21/60;H05K3/24 主分类号 C25D7/12
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