Photolithography method for contacting thin-film semiconductor structures,申请号AU20060225064-传众专利搜索

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发明名称	Photolithography method for contacting thin-film semiconductor structures
摘要
申请公布号	AU2006225064(A1)	申请公布日期	2006.09.21
申请号	AU20060225064	申请日期	2006.02.28
申请人	NEWSOUTH INNOVATIONS PTY LIMITED	发明人	ARMIN GERHARD ABERLE;TIMOTHY MICHAEL WALSH;DANIEL A INNS
分类号	H01L27/142;H01L31/04	主分类号	H01L27/142
代理机构		代理人
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