发明名称 SUBSTRATE INSPECTION APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a substrate inspection apparatus that prevents scratches on a substrate pattern surface or damages on a substrate. <P>SOLUTION: The substrate inspection apparatus for inspecting a substrate is equipped with a holding tool 102 to hold a substrate 101 and an impact absorbing unit 103 which is placed on the holding tool 102 in a non-contact state with the substrate 101 and abutted on the substrate 101 when the substrate 101 is moved from the holding position by the holding tool 102 to absorb impact force due to the contact. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006251005(A) 申请公布日期 2006.09.21
申请号 JP20050063703 申请日期 2005.03.08
申请人 ADVANCED MASK INSPECTION TECHNOLOGY KK 发明人 KUDO AKIRA;TAKAHARA KENICHI
分类号 G03F1/68;G03F1/84 主分类号 G03F1/68
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