| 摘要 |
An exposure apparatus has a projection optical system configured to project a pattern of a reticle onto a substrate, and exposes the substrate to light via the reticle and said projection optical system with a space between said projection optical system and the substrate filled with liquid. The apparatus includes a supply nozzle configured to supply liquid to the space; a supply path configured to supply the liquid to said supply nozzle; a bypass which branches from said supply path; and a supply control valve configured to change a flow rate of the liquid supplied from said supply path to said supply nozzle and a flow rate of the liquid supplied from said supply path to said bypass.
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