| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection device capable of coping with micro-fineness in repetition pitches, without shortening a wavelength of illumination light. SOLUTION: This device is provided with a light source means Ls for emitting a dispersed light beam for illuminating an inspected substrate 20, an irradiation member 35 for making the dispersed beam get incident to bring a principal light beam thereof into a prescribed incident angle, so as to be guided to the inspected substrate, image focusing means 36, 37 for converging light from the inspected substrate to image-focus an image of the inspected substrate, an imaging means 39 for picking up the focused image, the first polarization plate 34 provided in an optical path from the light source means to the irradiation member, the second polarization plate 38 provided in an optical path from the image focusing means to the imaging means, a turning means for turning at least one of the first polarization plate and the second polarization plate, within a plane perpendicular to an optical axis, and a detection means 15 for detecting a defect on a surface of the inspected substrate, based on the images obtained, by the imaging means, in a plurality of turn positions by the turning means. COPYRIGHT: (C)2006,JPO&NCIPI
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