| 摘要 |
It is possible to suppress separation into blocks and flicker caused by exposure in sections in an active matrix substrate while preventing lowering of a numerical aperture, increase of parasitic capacity, and complication or a manufacturing procedure. In the active matrix substrate, a first pixel circuit (P1a) containing a first type TFT (16a1) and a second pixel circuit (P2a) containing a second type TFT (16a2) are alternately arranged in both of the row direction and the column direction. The first and the second type TFT (16a1, 16a2) are configured so that the increase/decrease of the parasitic capacity Cgd between the gate and the drain is inversed against the vertical direction pattern shift of the drain electrode with respect to the gate electrode. Thus, the two types of TFT are uniformly distributed so as to average the increase/decrease of the parasitic capacity Cgd caused by the pattern shift during manufacturing. The present invention may be applied to an active matrix substrate used in a liquid crystal display device and the like. |
