GAS FOR PLASMA DISCHARGE TREATMENT, GENERATION METHOD OF GAS FOR PLASMA DISCHARGE TREATMENT AND PLASMA DISCHARGE TREATMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide a gas for a plasma discharge treatment capable of executing a practically usable excellent treatment, to provide a generation method of a gas for a plasma discharge treatment and to provide a plasma discharge treatment method, in relation to various kinds of plasma discharge treatments such as thin-film deposition and cleaning carried out under pressure close to the atmospheric pressure by using a gas for a plasma discharge treatment containing nitrogen gas as a main constituent.

SOLUTION: This gas for a plasma discharge treatment is used for a plasma discharge treatment carried out by applying an electric field under pressure close to the atmospheric pressure and contains N4+ions having a time-averaged density not smaller than 8.0×1016[m-3].

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