发明名称 DROPLET DISCHARGE APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a droplet discharge apparatus capable of controlling the size of a pattern by quickening the drying timing of deposited droplets. SOLUTION: A reflection face 24R apart from a substrate 2 is formed on a substrate stage to which a substrate 2 is conveyed and laser beam B1 is emitted to the substrate 2 at an incident angleθi; the laser beam B1 transmitted through the substrate 2 is reflected by the reflection face 24R; and the laser beam B1 reflected by the reflection face 24R is radiated to an arriving position Pa at an irradiation angleθd. The irradiation direction of the laser beam B1 radiated from the reflection face 24R is made close to the normal line direction (the direction shown as an arrow Z) of the substrate 2 (the rear face 2b). COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006247569(A) 申请公布日期 2006.09.21
申请号 JP20050069608 申请日期 2005.03.11
申请人 SEIKO EPSON CORP 发明人 IWATA YUJI
分类号 B05C5/00;B05C9/14 主分类号 B05C5/00
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