METHOD FOR FORMING A SILICIDE GATE STACK FOR USE IN A SELF-ALIGNED CONTACT ETCH,申请号KR20027012463-传众专利搜索

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发明名称	METHOD FOR FORMING A SILICIDE GATE STACK FOR USE IN A SELF-ALIGNED CONTACT ETCH
摘要
申请公布号	KR100626928(B1)	申请公布日期	2006.09.20
申请号	KR20027012463	申请日期	2001.03.22
申请人		发明人
分类号	H01L21/336;H01L21/28;H01L21/60;H01L21/8242;H01L27/10;H01L27/108	主分类号	H01L21/336
代理机构		代理人
主权项
地址

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