Method and device for controlling the contamination of wafer substrates

摘要

The device has a gas analyzer (2) comprising ionizing and identifying units. An adapter (5) connects a front opening universal pod or standard mechanical interface type transport enclosure (1) containing inert gas e.g. nitrogen, with a pipe (3). The pipe sucks the gas from the enclosure and conveys the gas until an inlet of the analyzer. The ionizing unit ionizes the gas at atmospheric pressure and the identifying unit identifies the ionized gas by the measurement of a parameter of ions obtained through ionization. An independent claim is also included for: a method for controlling contamination of wafers or other parts.