首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
BEAM GATE CHAMBER FOR ION IMPLANTER
摘要
申请公布号
KR20060099776(A)
申请公布日期
2006.09.20
申请号
KR20050021215
申请日期
2005.03.15
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
LEE, HA SUNG
分类号
H01L21/265;H01L21/02
主分类号
H01L21/265
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Biocompatible emulsifier
A process for making functionalized polymers
Image processing method
Method and system for composing electronic music and generating graphical information
Dry Solid Medium For Biological Sample Collection And/Or Storageincorporating Material For Sample Visualisation
Process for making 2- (2,4- dihydroxyphenyl) or 2- (2,4- dialkoxyphenyl)- 4,6- bisaryl- 1,3,5- triazines
Methods of treating osteoarthritis with inducible nitric oxide synthase inhibitors
Intravenous infusion needle with soft body
Scanning electron beam microscope
Peptide nucleic acid-oligoadenylate chimeric molecules
Optical lens support and method for using same
Locating underground power cable faults
Monolithic ceramic material comprising an antimicrobial material
Wheelchair with aerobic attachment
Ophthalmic compositions and process of using
Belt having antimicrobial action
Antimicrobial composition for handwash and a method of cleaning skin using the same
Composition for the removal of biological and organic substances
Fast resonance shifting as a way to reduce propellant for space mission applications
11beta-fluoro- 7alpha-(14, 14,15,15,15- pentafluoro-6- methyl-10-thia- 6-azapentadecyl) estra-1,3,5(10)- triene-3, 17beta-diol as a crystalline solvate