发明名称 Plate-making method of negative-working lithographic printing plate precursor
摘要 <p>A plate-making method comprising: exposing a lithographic printing plate precursor comprising a hydrophilic support, a photosensitive layer containing a sensitizing dye having absorption in a wavelength of 405 nm, a hexaarylbiimidazole compound, a polymerizable compound, a binder polymer and a chain transfer agent and a protective layer in this order with a laser beam having a wavelength of from 350 to 450 nm; and developing the exposed lithographic printing plate precursor with a developer having pH of 10.0 to 12.5 and containing an anionic surfactant in an amount of from 1.0 to 10.0% by weight.</p>
申请公布号 EP1703330(A1) 申请公布日期 2006.09.20
申请号 EP20060004383 申请日期 2006.03.03
申请人 FUJIFILM CORPORATION 发明人 INNO, TOSHIFUMI
分类号 G03F7/32;G03F7/031 主分类号 G03F7/32
代理机构 代理人
主权项
地址