发明名称 |
Lithographic apparatus and method to detect correct clamping of an object |
摘要 |
A lithographic apparatus includes a support structure adapted to clamp an object. The support structure and the object clamped thereon define a compartment. The supply structure is connected to the compartment and supplies a fluid to the compartment. The supply structure includes a meter to measure a change in at least one of flow velocity of the fluid and pressure of the fluid.
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申请公布号 |
US7110090(B2) |
申请公布日期 |
2006.09.19 |
申请号 |
US20040776644 |
申请日期 |
2004.02.12 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
NEERHOF HENDRIK ANTONY JOHANNES |
分类号 |
G03B27/58;G03B27/42;G03F7/20;H01L21/027 |
主分类号 |
G03B27/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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