发明名称 |
Chemical composition for dissolving a sample taken from semiconductor device fabrication equipment and method for analyzing contaminants on the equipment using the chemical composition |
摘要 |
A chemical for dissolving a sample taken from the semiconductor device fabrication equipment for analyzing the contaminants attached thereon, and a method of analyzing the contaminants thereby. The chemical composition is made of equal ports of sulfuric acid, hydrogen fluoride, and nitric acid. The method includes a) immersing a sample taken from semiconductor device fabrication equipment in the chemical composition; b) dissolving the sample in the chemical composition; c) cooling the dissolved sample; d) diluting the dissolved sample with deionized water and e) analyzing the diluted sample using either Atomic Absorption Spectrometer or by Atomic Emission Spectroscopy.
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申请公布号 |
US7109039(B1) |
申请公布日期 |
2006.09.19 |
申请号 |
US19980204364 |
申请日期 |
1998.12.04 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HUR YONG-WOO |
分类号 |
G01N1/28;G01N21/17;G01N21/31;G01N33/00;H01L21/66 |
主分类号 |
G01N1/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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