发明名称 |
Method for preventing and cleaning ruthenium-containing deposits in a CVD apparatus |
摘要 |
Carbon monoxide gas is provided in a ruthenium-deposition apparatus to clean undesired ruthenium-containing deposits from apparatus surfaces. Carbon monoxide gas is mixed with reactant gases in apparatus tubing and in a ruthenium-deposition reaction chamber to inhibit formation of undesired ruthenium deposits on apparatus surfaces and to remove ruthenium deposits.
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申请公布号 |
US7107998(B2) |
申请公布日期 |
2006.09.19 |
申请号 |
US20030687318 |
申请日期 |
2003.10.16 |
申请人 |
NOVELLUS SYSTEMS, INC. |
发明人 |
GREER HAROLD F. R.;FAIR JAMES A.;SUNG JUNGHWAN;DRAEGER NERISSA SUE |
分类号 |
B08B9/00;C23C16/16;C23C16/44;C23F4/00;C23G5/00 |
主分类号 |
B08B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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