发明名称 Movable stage system, lithographic apparatus, and device manufacturing method
摘要 A movable stage system capable of operating in a lithographic apparatus, is presented. The movable stage system includes a base, a platform that is movable relative to the base, a balance mass that is movable relative to the base and is configured to compensate for forces generated by a movement of the platform, and a drive mechanism configured to move the platform and the balance mass relative to the base. The drive mechanism comprises at least one belt transmission that couples the platform and the balance mass such that when the platform moves along a direction, the balance mass is moved in an at least partially opposite direction, and a driving device configured to mechanically engage the balance mass or the platform to directly drive the platform or the balance mass.
申请公布号 US7110086(B2) 申请公布日期 2006.09.19
申请号 US20040864805 申请日期 2004.06.10
申请人 ASML NETHERLANDS B.V. 发明人 LOOPSTRA ERIK ROELOF;MUNNIG SCHMIDT ROBERT-HAN
分类号 G03B27/42;G03B27/58;G03F7/20;H01L21/027;H01L21/68;H02K41/00 主分类号 G03B27/42
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