| 摘要 |
A solid source precursor material is delivered to a deposition chamber in vaporized form by utilizing a solid source precursor delivery system having either single or multiple stations(s) having a collection/delivery reservoir that is an intermediate stage between a solid source reservoir and a processing deposition chamber. Each collection/delivery reservoir transitions between a collection phase of the solid precursor and the delivery stage of the vaporized precursor during the deposition of a film.
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