首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
Apparatus for cleaning wafer and method thereof
摘要
申请公布号
KR100621705(B1)
申请公布日期
2006.09.19
申请号
KR20040041243
申请日期
2004.06.07
申请人
发明人
分类号
H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
您可能感兴趣的专利
CONDUCTION SYSTEM FOR THIN FILM AND HYBRID INTEGRATED CIRCUITS
HEAD ASSEMBLY FOR RECORDING AND READING, EMPLOYING INDUCTIVE AND MAGNETORESISTIVE ELEMENTS
FLASH WELDER MONITOR
MULTIGIGAWATT PEAK-POWER GENERATION FROM PULSE TYPE LASERS
DISC BOWLING GAME
PROCESS FOR THE PREPARATION OF NEW PYRIDINE DERIVATIVES
PYRIDAZINIUM COMPOUNDS AND A PROCESS FOR THEIR PRODUCTION
CATALYTIC PROCESS FOR IMIDE-ALCOHOL CONDENSATION
PROCESS FOR THE PREPARATION OF A NEAMINE DERIVATIVE AND ITS SALTS
VACUUM PUMP
TAPE APPLYING DEVICE
METHOD FOR CONTINUOUSLY POLARIZING THERMOPLASTIC FILM
DIAZEPIN-TYPE ANTIBIOTIC FROM STREPTOMYCES ANTIBIOTICUS
METHOD FOR THE REMOVAL OF SULFUR DIOXIDE FROM GAS MIXTURES
CYCLONE CENTRIFUGE APPARATUS
SERVO VALVE DEVICE IN POWER STEERING APPARATUS
PRINTER
EXHAUST REACTION CHAMBER SYSTEM OF ENGINE
MECHANISM TO ADJUST SEATBACK INCLINATION
PORTABLE RISER