METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE HAVING A COMPOSITE DIELECTRIC LAYER SUBJECTED TO A SURFACE TREATMENT,申请号KR20050018525-传众专利搜索

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发明名称	METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE HAVING A COMPOSITE DIELECTRIC LAYER SUBJECTED TO A SURFACE TREATMENT
摘要
申请公布号	KR20060097807(A)	申请公布日期	2006.09.18
申请号	KR20050018525	申请日期	2005.03.07
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	CHOI, HAN MEI;YOON, KYOUNG RYUL;LEE, SEUNG HWAN;PARK, KI YEON;CHOI, DAE SIK
分类号	H01L21/314;H01L27/115	主分类号	H01L21/314
代理机构		代理人
主权项
地址

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