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发明名称
雷射二极体装置
摘要
本发明提供一种雷射二极体装置,其藉由将AlGaInN化合物半导体用作材料而能够获得高光效率并改良输出。该雷射二极体装置包括半导体层,该半导体层具有一作用层且由氮化物III–V族化合物半导体制成,该化合物半导体包含3B族元素中之铝(Al)、镓(Ga)及铟(In)中的至少一者及5B族元素中之氮(N)。该作用层具有一条形发光区域,该区域之宽度W为自5μm至30μm,长度L为自300μm至800μm,且来自该作用层之雷射光的输出为200mW或200mW以上。
申请公布号
TW200633330
申请公布日期
2006.09.16
申请号
TW094144613
申请日期
2005.12.16
申请人
新力股份有限公司
发明人
平田照二
分类号
H01S5/10;H01S5/323
主分类号
H01S5/10
代理机构
代理人
陈长文
主权项
地址
日本
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