| 发明名称 |
CMP-ZUSAMMENSETZUNG ENTHALTEND SILANMODIFIZIERTE- SCHLEIFTEILCHEN |
| 摘要 |
<p>A polishing composition comprising a dispersion of silane-modified abrasive particles formed by combining at least one metal oxide abrasive having at least one surface metal hydroxide with at least one silane compound and methods for polishing substrate features such as metal features and oxide features using the polishing compositions.</p> |
| 申请公布号 |
AT338100(T) |
申请公布日期 |
2006.09.15 |
| 申请号 |
AT20000943380T |
申请日期 |
2000.07.05 |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
GRUMBINE, STEVEN, K.;STREINZ, CHRISTOPHER, C.;WANG, SHUMIN |
| 分类号 |
B24B37/00;C09G1/02;C09K3/14;H01L21/304;(IPC1-7):C09G1/02 |
主分类号 |
B24B37/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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