POLISHING PAD AND PROCESS FOR PRODUCING THE SAME

摘要

A polishing pad which comprises a polishing layer comprising a polyurethane resin foam. The polyurethane resin foam is a cured product obtained by the reaction of an isocyanate-terminated prepolymer with a chain extender, wherein (1) an aromatic polyamine having a melting point of 70°C or lower is used as the chain extender, (2) an isocyanate-terminated prepolymer comprising an isocyanate ingredient and a high-molecular polyol is used and an EO/PO adduct of an aromatic diol is used as the chain extender, or (3) an aliphatic/alicyclic isocyanate-terminated prepolymer is used and a nonhalogenated aromatic amine is used as the chain extender. For the polyurethane resin foam, a polymerized diisocyanate and an aromatic diisocyanate may be used as an isocyanate ingredient. Thus, a polishing pad is obtained which has extremely even fine cells, excellent polishing properties (smoothing properties), and improved dressing ability.