| 摘要 |
PROBLEM TO BE SOLVED: To provide a device and method for washing and drying a substrate which washes and dries the substrate while turning the same. SOLUTION: The device is provided with an injection unit equipped with a first injection port and a second injection port, through which mutually different fluid is injected respectively and which are arranged in one row on a line in the moving direction of these injection ports or a line neighbored to the moving direction of the nozzle. The injection unit is moved along a straight line from the center of the substrate to the edge of the same by a moving unit, while the first injection port and the second injection port are arranged in one row on the moving line of the injection unit. COPYRIGHT: (C)2006,JPO&NCIPI
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