| 摘要 |
PROBLEM TO BE SOLVED: To provide an ultraviolet absorbing protective film which effectively controls irregular reflection light from an underlying substrate in an exposure process in forming a color filter and a microlens in a solid-state imaging device, and which has high heat and light resistance, and also to provide a resin composition for the ultraviolet absorbing protective film for forming the film, and the solid-state imaging device using the film. SOLUTION: The resin composition for the ultraviolet absorbing protective film contains following components, [A] a polymer with epoxy groups, having 500 g/mol or less epoxy equivalent and having 3,000-100,000 weight average molecular weight (MW) in terms of polystyrene, [B] a latent polyvalent carboxylic acid obtained by reacting a polyvalent carboxylic acid compound and a vinyl ether, [C] one or more kinds of organic ultraviolet absorbing agents selected from a group composed of a benzophenone based ultraviolet absorbing agent, a benzoate based ultraviolet absorbing agent, a benzotriazole based ultraviolet absorbing agent, and a cyanoacrylate based ultraviolet absorbing agent, and [D] cerium oxide with 10 nm or less average particle diameter. COPYRIGHT: (C)2006,JPO&NCIPI
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