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发明名称
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
摘要
申请公布号
KR20060097528(A)
申请公布日期
2006.09.14
申请号
KR20050074118
申请日期
2005.08.12
申请人
HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人
IKEGAMI EIJI;KOROYASU KUNIHIKO;KANEKIYO TADAMITSU;SUMIYA MASAHIRO
分类号
H01L21/3065
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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