MASK FOR EXPOSURE, AND METHOD FOR MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a mask for exposure which is used for forming a pattern by utilizing an action of a photocatalyst by an energy irradiation, and has a photocatalyst containing layer capable of forming patterns different in characteristic efficiently with high resolution.

SOLUTION: This mask for exposure comprises: a substrate; the photocatalyst containing layer formed on the substrate and at least containing the photocatalyst; an inorganic oxide layer formed on the photocatalyst containing layer; and a shielding portion formed in a pattern on the inorganic oxide layer.

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