CLEANING METHOD AND CLEANING APPARATUS

摘要

PROBLEM TO BE SOLVED: To prevent a surface to be cleaned from being not cleaned in a member to be cleaned by changing a plurality of supporting points against the member to be cleaned such as a tube or the like, and cleaning the member to be cleaned in a manner that a cleaning liquid is not jetted by constantly fixing a supporting point. SOLUTION: The cleaning apparatus jets a cleaning liquid in a state that a member m to be cleaned (tube) that is a member of a semiconductor manufacturing apparatus is supported. The apparatus is provided with a first supporting jig 5A having a plurality of supporting points 5a to support the member to be cleaned, a second supporting jig 6A having a plurality of supporting points 6a to support the member to be cleaned in a different region from that of the supporting points by the first supporting jig 5A, and a supporting jig changeover mechanism 7 to switch the first supporting jig 5A and the second supporting jig 6B alternately to a working state and a non-working state. COPYRIGHT: (C)2006,JPO&NCIPI