| 摘要 |
PROBLEM TO BE SOLVED: To provide a treatment apparatus for a substrate in which the force of pushing a roll brush against the surface of a substrate is easily and correctly performed. SOLUTION: The substrate treatment apparatus is provided with a brushing/cleaning part 7 for cleaning the substrate to be conveyed in a chamber. The brushing/cleaning part is provided with: a pair of roll brushes 31, 32 for brushing both surfaces of the substrate to be conveyed; an upper space adjustment mechanism 41 for adjusting the force of pushing the axially upper end side of each of roll brushes against the surface of the substrate; a lower space adjustment mechanism 55 for adjusting the force of pushing the axially lower end side of each of roll brushes against the surface of the substrate; a first linkage shaft 98 to be rotated linked with the adjustment of the force of pushing the upper or lower end side of one of roll brushes against the surface of the substrate by each of space adjustment mechanisms; and a second linkage shaft 99 to be rotated linked with the adjustment of the force of pushing the upper or lower end side of the other of roll brushes against the surface of the substrate by each of space adjustment mechanisms. COPYRIGHT: (C)2006,JPO&NCIPI
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