发明名称 DEVICE AND METHOD FOR PLASMA PROCESSING
摘要 PROBLEM TO BE SOLVED: To provide a plasma processing device in which a light emitting state of a plasma near a to-be-processed object is easily found. SOLUTION: A photo detecting part 13 for detecting light emission of the plasma is fit to a to-be-processed object supporting table 12 for holding the to-be-processed object 11, and an optical transmission means 14 for taking the detected emitted light out of the device is fit, and the emitted light taken out of the device by the optical transmission means 14 is divided by a spectroscopy 15, to record in a data recording device 16. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006245509(A) 申请公布日期 2006.09.14
申请号 JP20050062841 申请日期 2005.03.07
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 IWAKOSHI TAKENAO;TANAKA JUNICHI;KITSUNAI HIROYUKI;SUGANO SEIICHIRO;MASUDA TOSHIO
分类号 H01L21/3065 主分类号 H01L21/3065
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