| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid processor capable of easily removing an adhered substance deposited on a cup. SOLUTION: A resist application and processing unit (COT) has a spin chuck 41 for holding and rotating a wafer W, the cup 43 placed to surround the wafer W held on the spin chuck 41, a resist nozzle 44 for supplying a resist liquid to the wafer W, and first and second chemical nozzles 46 and 47 for supplying a protective film forming chemical to a protective film forming tool 60 when the tool 60 is held on the spin chuck 41. The unit is structured such that a peelable protective film 10 is formed on a part where the resist liquid shaken out from the wafer W rotating on the cup 43 is applied when forming a resist film on the wafer W. COPYRIGHT: (C)2006,JPO&NCIPI
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