| 摘要 |
PROBLEM TO BE SOLVED: To provide a means for exactly and safely measuring water level in the precursor remaining in a container in a chemical vapor deposition process in real-time. SOLUTION: There are provided a device and method of diagnosing residual quantity of precursor in a container during chemical vapor deposition process, and more in detail, during the chemical vapor deposition process for exactly measuring water level of the precursor remaining in the container by analyzing the signals generated through transmission/reception of ultrasonic wave. Thus, with the invention by providing a water level diagnostic instrument using ultrasonic wave in the container wherein the precursor is stored, damage due to depletion of the precursor is previously prevented by measuring the water level of the precursor in real time, defective fraction of a product can be decreased remarkably. Since exact exchange timing of the precursor is known from the measured results, usable period of the precursor can be maximized. COPYRIGHT: (C)2006,JPO&NCIPI |
