| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in resolution. <P>SOLUTION: The positive resist composition contains a resin component (A) the alkali solubility of which is increased by an effect of an acid, and an acid generating agent component (B) which generates an acid by exposure. The component (A) contains: a first resin component (A1) having a first structural unit derived from hydroxystyrene, a second structural unit derived from a (meth)acrylic acid ester having an alcoholic hydroxyl group, a third structural unit derived from hydroxystyrene in which the hydroxyl group is protected by an acid dissociable dissolution inhibiting group, and/or a fourth structural unit derived from a (meth)acrylic acid ester having an alcoholic hydroxyl group in which the alcoholic hydroxyl group is protected with an acid dissociable dissolution inhibiting group; and a second resin component (A2) having a fifth structural unit derived from hydroxystyrene and a sixth structural unit derived from hydroxystyrene in which the hydroxyl group is protected with an acid dissociable dissolution inhibiting group. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
