| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer for forming an overlay film on a photoresist without causing intermixing with the photoresist film and for forming an overlay film that keeps a stable coating film without elution into a medium during liquid immersion exposure, that induces no deterioration of a pattern figure when the film is subjected to not to liquid immersion exposure but to dry exposure, and that is easily dissolved in an alkali developing solution. <P>SOLUTION: The polymer for forming an overlay film covering a photoresist film to be subjected to liquid immersion exposure contains repeating units having a group containing a fluorine atom in the side chains, by 30 to 100 mol% of the whole repeating units, has 2,000 to 100,000 weight average molecular weight measured by gel permeation chromatography, and is alkali soluble. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
