| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing an active matrix substrate with high reliability and the active matrix substrate obtained by this method of manufacturing this without destroying the texture or functionality of the active matrix element when a first support substrate is imprinted on a second support substrate. SOLUTION: It includes a matrix of the pixel having the first support substrate 21, a first depositing layer 22 provided on this first support substrate 21 so that either at least quality of the material or the composition is in this first support substrate 21, a second depositing layer 13 provided on this first depositing layer 22 so that either at least the quality of the material or the composition is in this first depositing layer 22, a third depositing layer 14 provided on this second depositing layer 13 so that either at least the quality of the material or composition is in this second depositing layer 13, and thin film transistors (15S, 15C, 15D, 16, 17, 19, and 20) provided on this third depositing layer 14. COPYRIGHT: (C)2006,JPO&NCIPI |
