| 摘要 |
PROBLEM TO BE SOLVED: To provide a paper substrate cleaning device and its method in which a reduced cost, a saved space and an environment problem are taken into consideration. SOLUTION: The substrate cleaning device 1 has a rotary table 50 rotatably supporting a silicon substrate, a light irradiation device 30 capable of irradiating at least one part of the surface of the supported silicon substrate with light, a nozzle 40 capable of selectively supplying at least N<SB>2</SB>O water and a hydrofluoric acid solution onto the substrate, and a control unit 100 controlling the supply of the light irradiation device 30 and the nozzle 40, and capable of light irradiation by the light irradiation device 30 when the N<SB>2</SB>O water is supplied onto the silicon substrate. COPYRIGHT: (C)2006,JPO&NCIPI
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