| 摘要 |
PROBLEM TO BE SOLVED: To provide a film thickness measuring device and a film thickness measuring method, capable of measuring even the thickness of a film formed from a material having a large absorption quantity of infrared rays, such as graphite or a material, having properties similar to a material of a base material relative to the absorption quantity of the infrared rays. SOLUTION: This device is equipped with an operation means 5 for calculating the film thickness D of a measuring object A, based on a time fluctuation characteristic of the temperature on the heating surface HS of the measuring object A and the temperature of the heating surface HS of the measuring object A measured by a temperature measuring means. The temperature measuring means is a galvanomirror scanning type infrared thermography 2. The operation means 5 is equipped with a heating timing detection part 6 for calculating the timing, when the temperature rise of the heating surface HS of the measuring object A is started by heating by a heating means 10, and a film thickness calculation part 7 for calculating the film thickness D of the measuring object A, based on the temperature rise start timing T0 of the heating surface HS of the measuring object A detected by the heating timing detection part 6 and the temperature of the heating surface HS of the measuring object A. COPYRIGHT: (C)2006,JPO&NCIPI
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