| 摘要 |
<p>Real time measurement of film properties of a translucent film is performed and the film properties are controlled at a high accuracy by a base material processing apparatus, which is provided for forming a translucent film on a surface of a base material or for performing film processing to the translucent film formed on the surface of the base material. The base material processing apparatus (1) is provided with a light irradiation means (50) for applying a light (L) from a translucent film side to the base material (10) on which the translucent film is being formed on the surface or to which the film processing is being performed to the translucent film formed on the surface; and a film property measuring means (60), which receives a reflecting light (R) of the light (L) from the base material (10) during the film formation or during the film processing, detects an interference light of a first reflecting light, which is included in the reflecting light (R) and is reflected on the surface of the translucent film, and a second reflecting light, which is reflected on an interface between the translucent film and the base material (10), and measures the film properties of the translucent film by a peak-valley method.</p> |
