MANUFACTURING METHOD OF MEMBER HAVING ANTIREFLECTION STRUCTURE BODY

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of an antireflection structure body which has a high antireflection effect using hologram exposure caused by luminous flux interference.

SOLUTION: In the manufacturing method of a member having antireflection structure body, the antireflection structure body comprises a prescribed shape body as a structural unit and is formed by arranging a plurality of prescribed shape bodies in an array state with at most a pitch of wavelength of the light whose reflectance should be reduced. The manufacturing method of the member having antireflection structure body comprises: a first exposure process in which a light intensity distribution composed of interference fringe pattern formed by directly superimposing two luminous fluxes to each other is generated on a substrate as the member above mentioned of which at least the structure body formation surface is made of photosensitive material and the substrate is exposed; a second exposure process including at least two times of exposure process in which the relative positional relation between the substrate and the interference fringe pattern is changed so that the interference fringe pattern formed on the substrate has such a relation as to form a prescribed angle with the interference fringe pattern exposed on the first exposure process and, thereafter, the substrate is exposed; and a development process in which the exposed substrate is developed.

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