发明名称 METHOD AND APPARATUS FOR TREATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To efficiently form a high-quality metal film (protection film), especially on the surface of wiring etc. without deteriorating the electric property of the wiring by subjecting a substrate to an activation treatment such as catalyst-imparting treatment using an optimized processing liquid. SOLUTION: The metal film is formed on the surface of the substrate by contacting the surface of the substrate, preferably cooled to a prescribed temperature of≤15°C, to the processing liquid whose temperature is adjusted to≤15°C to activate the surface, and then contacting the activated surface of the substrate to a plating solution. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006241580(A) 申请公布日期 2006.09.14
申请号 JP20050062831 申请日期 2005.03.07
申请人 EBARA CORP 发明人 TAKAGI DAISUKE;O CHIKAAKI;OWATARI AKIRA;ISHIZAKA MASANORI;FUKUNAGA AKIRA
分类号 C23C18/18;C23C18/31;H01L21/28;H01L21/288;H01L21/3205 主分类号 C23C18/18
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