| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing synthetic quartz glass in which the occurrence of bubbles inside ingot is easily suppressed in the case of manufacturing the quartz glass. SOLUTION: The apparatus for manufacturing the synthetic quartz glass is provided with a synthetic furnace 11, a burner 12 for forming flame by jetting a silicon compound and a combustion gas into the synthetic furnace 11, a target 13 arranged rotatable and movable downward below the burner 12 to form the ingot and an exhaust port 11c opened below a deposition surface 14a of a deposition intermediate body 14 on the side wall of the synthetic furnace 11. The tilted angleθof the center axis O2 of the burner 12 to the rotary axis O1 of the deposited intermediate body 14 is made≥20°and≤60°. COPYRIGHT: (C)2006,JPO&NCIPI
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