发明名称 |
METHOD FOR PRODUCING A NANOSTRUCTURE ON A SUBSTRATE |
摘要 |
<p>Method involves irradiating a defined surface of the substrate (18) through ions for producing a nanostructure (22a,22b,22c) on required region (18a,18b,18c) of the surface. The irradiation brings about a selective alteration of the surface properties of the substrate. The method then involves the introduction of irradiating substrate into a supersaturated solution (20), which contains the material required to produce nanostructure. The material has been selectively deposited on the defined region in electroless fashion. The method then involves the removal of substrate form the solution after selective deposition of material.</p> |
申请公布号 |
WO2006094574(A1) |
申请公布日期 |
2006.09.14 |
申请号 |
WO2006EP00335 |
申请日期 |
2006.01.16 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.;HAHN-MEITNER INSTITUT BERLIN GMBH;BRUENGER, WILHELM H.;FINK, DIETMAR |
发明人 |
BRUENGER, WILHELM H.;FINK, DIETMAR |
分类号 |
H01L21/768 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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