发明名称 LIGHT-QUANTITY COMPENSATION METHOD OF EXPOSURE HEAD AND EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To make it difficult to visually recognize the uneven density of image that is caused by the light-quantity differential covering the array longitudinal direction of an exposure light in an exposure head which is composed of a line-like light-emitting element array and a lens array. SOLUTION: In the exposure head equipped with the line-like light-emitting element array wherein a plurality of light-emitting elements 20 are arranged side by side and the lens array 7 wherein lenses 7a are arranged side by side, the two or more light-emitting elements 20 are made to be uniformly lit based on a common luminescence order signal. The light-quantity of the light emitted from the lens array 7 at that time is measured for the array overall length in a photometric pitch narrower than the row pitch of the light emitting element 20. Based on the quantity of light measured in the above, a light-quantity correction factor Pn of each light-emitting elements 20 for correcting the luminescence quantity so as to make the light-quantity differential of the lens arrangement pitch cycle of the lens array covering the direction of light emitting element row appear at a shorter cycle. Then, the luminescence quantity of the light emitting element 20 that is controlled according to an image signal during the exposure is corrected based on the light-quantity correction factor Pn. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006240214(A) 申请公布日期 2006.09.14
申请号 JP20050062069 申请日期 2005.03.07
申请人 FUJI PHOTO FILM CO LTD 发明人 SETO YASUHIRO
分类号 B41J2/44;B41J2/45;B41J2/455 主分类号 B41J2/44
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