| 摘要 |
PROBLEM TO BE SOLVED: To provide a defect inspecting apparatus with a simple structure which detects linear defects extending along the direction of the manufacturing line, fine irregularities defects and tone-changed defects. SOLUTION: The defect inspecting apparatus comprises an illuminating device which illuminates a band-like illumination surface parallel to a band-like object in the width direction, such that only a horizontal incident line is tilted at a prescribed angle, in relation to a moving direction of the band-like object, in order to obtain a light intensity state uniform across the entire region of the band to be inspected; and an imaging device which effectively receives the intensity modulated light caused by scattered light from the minute irregularities defects, while suppressing only the specularly reflected components of the scattered/reflected light from a tone region that is the normal section of the band-like object, and which easily shades a reflection light image of the linear defect, extending along the direction of the production line. Thus, the irregularities defects and the linear defects, along the moving direction of the band-like object, can be detected simultaneously and with accuracy. COPYRIGHT: (C)2006,JPO&NCIPI
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