| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for performing exposure with high quality at an optimal position on image plane during scanning. <P>SOLUTION: The method for illuminating a body being exposed with an image through a pattern formed on a mask while filling the space between the last lens of a projection optical system and the body being exposed with liquid comprises a step for acquiring temperature information or aberration information of the liquid, a step for calculating the correction amount of the focal position of the image based on the temperature information, and a step for correcting the focal position of the image in synchronism with the scanning position for every shot based on the correction amount. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
