ATOMIC LAYER-DEPOSITED HAFNIUM-ALUMINUM OXIDE FILMS,申请号KR20047019834-传众专利搜索

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发明名称	ATOMIC LAYER-DEPOSITED HAFNIUM-ALUMINUM OXIDE FILMS
摘要
申请公布号	KR100623137(B1)	申请公布日期	2006.09.14
申请号	KR20047019834	申请日期	2003.06.05
申请人		发明人
分类号	C23C16/40;H01L21/20;H01L21/28;H01L21/316;H01L21/8242;H01L21/8247;H01L27/10;H01L27/108;H01L27/115;H01L29/51;H01L29/78;H01L29/788;H01L29/792	主分类号	C23C16/40
代理机构		代理人
主权项
地址

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