发明名称 METHOD FOR FORMING FILM PATTERN
摘要 PROBLEM TO BE SOLVED: To form a thin linear fine pattern accurately and stably. SOLUTION: A method for placing a functional fluid L on a substrate P to form a linear film pattern F has steps of forming a bank B on the substrate P, and placing the functional fluid L on a region defined by the bank B by a fluid-drop discharging method. The bank B includes a first recess 31 provided to correspond to the linear film pattern F, a second recess 32 connected to one end 33 of the first recess 31 in a longitudinal direction and having a width larger than the first recess 31, and an opening 35 formed at the other end 34 of the first recess 31 in the longitudinal direction. Drops of the functional fluid L are placed within the second recess 32, the functional fluid L is placed in the first recess 31 by the self fluidization of the function fluid L, and the self fluidization of the function fluid L is stopped at the opening 35 or in front thereof. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006245361(A) 申请公布日期 2006.09.14
申请号 JP20050060035 申请日期 2005.03.04
申请人 SEIKO EPSON CORP 发明人 ISHIDA KOHEI
分类号 H01L21/3205;B05D1/26;H01L21/288 主分类号 H01L21/3205
代理机构 代理人
主权项
地址